US20260131282
2026-05-14
Performing operations; transporting
B01D53/30
The system focuses on removing volatile organic compounds (VOCs) from exhaust fluids generated during semiconductor processes. By utilizing a machine learning model, the system continuously analyzes current VOC removal parameters to predict future removal efficiency. Based on these predictions, it generates adjustment parameters to optimize the system's performance, ensuring that VOCs are efficiently removed from the exhaust fluids.
The system is designed for exhaust fluid purification in semiconductor manufacturing. Semiconductor processes, such as thin-film deposition and etching, often produce exhaust fluids containing high levels of VOCs. These compounds are harmful to the environment if released untreated, emphasizing the need for effective removal systems in semiconductor facilities.
The VOC removal system includes several key components: a concentrator rotor with adsorption, cooling, and desorption zones; heat exchangers; an exhaust stack; and a control system. The control system uses machine learning to adjust operational parameters, enhancing the efficiency of VOC removal. This setup ensures that the exhaust fluid is purified before being released into the atmosphere.
The concentrator rotor, shaped like a large wheel, rotates through its zones to adsorb and desorb VOCs. The adsorption zone captures VOCs from the exhaust fluid, while the desorption zone releases them at high temperatures. The control system's adjustments, informed by machine learning, maintain optimal conditions for this process, resulting in cleaner emissions.
The concentrator rotor features a calcinated ceramic honeycomb substrate with an inorganic binder, such as aluminosilicate hydrate (zeolite), which facilitates VOC adsorption and desorption. This design allows the system to effectively handle high VOC concentrations at varying temperatures, contributing to its efficiency in purifying exhaust fluids from semiconductor processes.